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Etch Photo

Etch Chamber Components

Graphite and SUPERSiC components are produced to customer prints.


Silicon Carbide

SUPERSiC® silicon carbide, is typically used for plasma etch electrodes, showerheads, focus rings, hot edge rings, confinement rings and other chamber components. SUPERSiC is the  ideal material for current and legacy equipment as replacement components for silicon, quartz and other ceramics to improve process performance.


Currently, all SUPERSiC etch chamber components are custom made for OEMs to go in the next generation equipment.


Currently, all graphite etch chamber components are machined to customer prints. Typical graphite parts are backing rings, edge rings, backing plates, cathodes, bias plugs and pins. Materials used for these applications are DFP-1 and DFP-2.